CLONE dual-mode plasma etching machine cleaning machine-Fornitore globale

Product Groups

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proximity aligner
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Electron microscope sample cleaning machine
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Liquid particle size analyzer
EzAFM portable atomic force microscope
Laser sampling
Precision glass cutting machine (desktop type)
ADR low-temperature constant temperature dry mK system
Liquid Particle Sizer - LPC
High temperature 3D printer
Block resistance tester
S100 type digital source table
NX12 Biological Atomic Force Microscope
Zeta-388 automatic multi-mode optical profilometer
TS200-HP high-power probe station
Zeta-300 multi-mode optical profilometer
TS2000-DP high-power probe station
TS50 manual small probe station
TS2500-RF Fully Automatic RF Probe Station
TS3000 automatic probe station
MicroXAM800 White Light Interferometer
TS300 12 inch manual probe station
MDO34 oscilloscope
In situ AFM in SEM
Pulse laser deposition system (PLD)
Active Vibration Isolation Platform AMT
Duramin-100 hardness tester
3-inch nanoimprint machine NIL75
In situ automatic nanomanipulation system
In situ MEMS chips and synchrotron radiation holders
In SEM HT high-temperature in-situ nanoindentation instrument
Duramin-4 hardness tester
High temperature in-situ nanoindentation instrument
Active isolation table ARISTT
Active isolation table ARISMD
Passive vibration isolation SOTOT
Passive isolation table GWA-M
Passive isolation table GWA-TO
Active isolation table PMT
Diener Pico plasma cleaning machine
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ACCUTOM-10/-100 cutting equipment
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DM 4500P semi-automatic intelligent digital polarizing microscope
Leica M Series Stereoscopic Microscope LeicaM165FC/205FA
S series stereomicroscope
Leica M Series Stereoscopic Microscope LeicaM125/165C/205C/205A
DM750P professional polarizing microscope
EUV/X-ray reflector
X-ray Fresnel zone plate (FZP)
Grating template
MPI Titan RF Accessories
GGB microwave probe
Quantifoil porous mesh carrier
GGB calibration standard sample
Customized vibration isolation system
Ion beam etching/deposition system
Silicon nitride thin film window
AFM substrate
AFM probe
MPI RF calibration substrate
GGB active high impedance needle tip
GGB DC probe
Hole shaped template
Prism coupler
Duramin-40 hardness tester
4-inch nanoimprint machine NIL-100
Leica room temperature ultra-thin slicer Leica EM UC7
Film thickness measuring instrument
BI-2500 desktop surface plasmon resonance analyzer
Established Active Vibration Isolation Platform
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TS150-HP high-power probe station
Scanwave Scanning Microwave Near Field Impedance Microscope
MVI scattering scanning near-field optical microscope
TS150 6-inch manual probe station
4200A-SCS parameter analyzer
F40 Microscopic Film Thickness Measuring Instrument
Zeta20 multi-mode 3D optical profilometer

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Room 707, Aiqian Building, 599 Lingling Road, Xuhui District, Shanghai, China

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CLONE dual-mode plasma etching machine cleaning machine

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Product details

Desktop plasma cleaning and etching system, plasma etching&Reactive ion etching system

Chamber structure:

Model comparison:

Application:

·EtchingOxide etchingRIEMode, nitride etchingRIEMode, silicon etchingRIEMode, photoresist etchingRIEPattern, polymer（RIE+PE）Two dimensional materialsRIE

·Surface TreatmentHydrophilic treatmentPEMode, functionalizationPEMode, enhanced adhesion:PE+RIEPolymer: RIE+PE

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